Passivation of pigment-grade TiO(2) particles by nanothick atomic layer deposited SiO(2) films.

@article{King2008PassivationOP,
  title={Passivation of pigment-grade TiO(2) particles by nanothick atomic layer deposited SiO(2) films.},
  author={David M. King and Xinhua Liang and Beau B Burton and M Kamal Akhtar and Alan W. Weimer},
  journal={Nanotechnology},
  year={2008},
  volume={19 25},
  pages={255604}
}
Pigment-grade TiO(2) particles were passivated using nanothick insulating films fabricated by atomic layer deposition (ALD). Conformal SiO(2) and Al(2)O(3) layers were coated onto anatase and rutile powders in a fluidized bed reactor. SiO(2) films were deposited using tris-dimethylaminosilane (TDMAS) and H(2)O(2) at 500 °C. Trimethylaluminum and water were used as precursors for Al(2)O(3) ALD at 177 °C. The photocatalytic activity of anatase pigment-grade TiO(2) was decreased by 98% after the… CONTINUE READING