Partial diagnostic data to plasma etch modeling using neural network

@inproceedings{Kim2004PartialDD,
  title={Partial diagnostic data to plasma etch modeling using neural network},
  author={Byungwhan Kim and Sebum Kim},
  year={2004}
}
Partial diagnostic data are used to construct a neural network model for plasma control. The diagnostic data were collected using an optical emission spectroscopy (OES) during the etching of oxide films in CHF"3/CF"4 discharges. The etch process was systematically characterized by means of a statistical experimental design. The etch outputs to model include an etch rate, profile angle, and etch rate nonuniformity. The experimental data were modeled using a backpropagation neural network, while… CONTINUE READING

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