Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene

Abstract

Atomic layer deposition (ALD) of ultrathin aluminum oxide (AlOx) films was systematically studied on supported chemical vapor deposition (CVD) graphene. We show that by extending the precursor residence time, using either a multiple-pulse sequence or a soaking period, ultrathin continuous AlOx films can be achieved directly on graphene using standard H2O… (More)

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Cite this paper

@inproceedings{Aria2016ParameterSO, title={Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene}, author={Adrianus I. Aria and Kenichi Nakanishi and Long Xiao and Philipp Braeuninger-Weimer and Abhay A. Sagade and Jack A. Alexander-Webber and Stephan Hofmann}, booktitle={ACS applied materials & interfaces}, year={2016} }