PSG trapping of metal contaminants during belt furnace inline phosphorus diffusion in crystalline Si wafers

Abstract

Inline wet chemical phosphorus coating and thermal diffusion in a conveyor furnace is a high-throughput alternative to the conventional batch POCl<inf>3</inf> process. There is now significant interest in the adoption of inline diffusion on an industrial scale in order to achieve a continuous flow, low-cost process which interfaces well with other inline… (More)

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@article{Richter2010PSGTO, title={PSG trapping of metal contaminants during belt furnace inline phosphorus diffusion in crystalline Si wafers}, author={Paul J. Richter and Frank J. Bottari and David C. Wong}, journal={2010 35th IEEE Photovoltaic Specialists Conference}, year={2010}, pages={003593-003596} }