Oxidation of fluorinated amorphous carbon (a-CF(x)) films.

@article{Yun2010OxidationOF,
  title={Oxidation of fluorinated amorphous carbon (a-CF(x)) films.},
  author={Yang Yun and Esteban D. Broitman and Andrew J Gellman},
  journal={Langmuir : the ACS journal of surfaces and colloids},
  year={2010},
  volume={26 2},
  pages={
          908-14
        }
}
Amorphous fluorinated carbon (a-CF(x)) films have a variety of potential technological applications. In most such applications these films are exposed to air and undergo partial surface oxidation. X-ray photoemission spectroscopy has been used to study the oxidation of fresh a-CF(x) films deposited by magnetron sputtering. The oxygen sticking coefficient measured by exposure to low pressures (<10(-3) Torr) of oxygen at room temperature is on the order of S approximately 10(-6), indicating that… CONTINUE READING
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