Overcoming research challenges for CMOS scaling: industry directions

  title={Overcoming research challenges for CMOS scaling: industry directions},
  author={Tze-Chiang Chen},
  journal={2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings},
  • Tze-Chiang Chen
  • Published 2006 in
    2006 8th International Conference on Solid-State…
The development of silicon technology has been, and will continue to be, driven by system needs. The continuous and systematic increase in transistor density and performance, guided by CMOS scaling theory (Dennard et al., 1974) and described in "Moore's Law" (Moore, 1975), has been a highly successful process for the development of silicon technology for the past 40 years. As the silicon industry moves into the 45 nm node and beyond, significant technology challenges are imposed by silicon CMOS… CONTINUE READING
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