Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool
@inproceedings{George2009OutofbandEC, title={Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool}, author={S. George and P. Naulleau and Senajith B. Rekawa and E. Gullikson and C. D. Kemp}, booktitle={Advanced Lithography}, year={2009} }
For the commercialization of extreme ultraviolet lithography (EUVL), discharge or laser produced, pulsed plasma light sources are being considered. These sources are known to emit into a broad range of wavelengths that are collectively referred to as the out-of-band (OOB) radiation by lithographers. Multilayer EUV optics reflect OOB radiation emitted by the EUV sources onto the wafer plane resulting in unwanted background exposure of the resist (flare) and reduced image contrast. The… Expand
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References
SHOWING 1-10 OF 26 REFERENCES
Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation
- Materials Science, Engineering
- SPIE Advanced Lithography
- 2008
- 11
Absolute evaluation of out-of-band radiation from laser-produced tin plasmas for extreme ultraviolet lithography
- Physics
- 2008
- 26
Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool
- Environmental Science, Engineering
- SPIE Advanced Lithography
- 2008
- 12
- PDF
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic
- Materials Science
- 2004
- 38
- PDF
Absolute sensitivity calibration of extreme ultraviolet photoresists.
- Environmental Science, Medicine
- Optics express
- 2008
- 9
- PDF
Chemically amplified resists resolving 25 nm 1:1 line: space features with EUV lithography
- Materials Science, Engineering
- SPIE Advanced Lithography
- 2007
- 33
Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography.
- Physics, Medicine
- Applied optics
- 2003
- 47
- PDF