Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method

Abstract

A three-level six-factor (arc power, substrate temperature, pre-treatment bias voltage, working pressure, deposition bias voltage and pretreatment time) orthogonal experimental array (L18) to optimize the adhesion strength of arc ion plating (AIP) TiAlN films was designed using the Taguchi method. An optimized film process, namely substrate temperature 220… (More)

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