Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography.

@article{Baruth2014OptimizationOL,
  title={Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography.},
  author={Andrew Baruth and Myungeun Seo and Chun Hao Lin and Kern Walster and Arjun Shankar and Marc A Hillmyer and Christopher Leighton},
  journal={ACS applied materials & interfaces},
  year={2014},
  volume={6 16},
  pages={13770-81}
}
Detailed experiments designed to optimize and understand the solvent vapor annealing of cylinder-forming poly(styrene)-block-poly(lactide) thin films for nanolithographic applications are reported. By combining climate-controlled solvent vapor annealing (including in situ probes of solvent concentration) with comparative small-angle X-ray scattering studies… CONTINUE READING