Optimization of Ta2O5 optical thin film deposited by radio frequency magnetron sputtering.

@article{Shakoury2016OptimizationOT,
  title={Optimization of Ta2O5 optical thin film deposited by radio frequency magnetron sputtering.},
  author={Reza Shakoury and Ronald R. Willey},
  journal={Applied optics},
  year={2016},
  volume={55 20},
  pages={
          5353-7
        }
}
Radio frequency magnetron sputtering has been used here to find the parameters at which to deposit Ta2O5 optical thin films with negligible absorption in the visible spectrum. The design of experiment methodology was employed to minimize the number of experiments needed to find the optimal results. Two independent approaches were used to determine the index of refraction n and k values. 
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References

SHOWING 1-10 OF 25 REFERENCES
OPTICAL CONSTANTS OF THE THERMALLY EVAPORATED a-Se70Ge30 THIN FILMS
Thermal evaporation technique was used to prepare a-Ge70Se30 thin films onto glass substrates of thicknesses range (108–717 nm). Transmittance measurements in the wavelength range (400-2500nm) were…
Electrical and Optical Characteristics of Ta2O5 Thin Films Deposited by Electron-Beam Vapor Deposition
Ta 2 O 5 is a material with good perspectives for many applications in modern electronics and information technologies. Several deposition techniques of thin Ta 2 O 5 films have been suggested.…
Preparation and properties of high refractive index tantalum pentoxide coatings deposited by plasma ion assisted deposition with xenon or argon assistance
Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films
Infrared optical properties of amorphous and nanocrystalline Ta2O5 thin films
The optical constants of tantalum pentoxide (Ta2O5) are determined in a broad spectral region from the visible to the far infrared. Ta2O5 films of various thicknesses from approximately 170 to 1600…
Optical properties and microstructure of Ta2O5 biaxial film.
TLDR
A good agreement between the measured optical properties and theoretical calculation is obtained, which validates the model established for thin film produced by glancing angle deposition.
Biomedical response of tantalum oxide films deposited by DC reactive unbalanced magnetron sputtering
The study of optical and microstructural evolution of Ta2O5 and SiO2 thin films by plasma ion assisted deposition method
High performance sputtered/anodized tantalum oxide capacitors
High-performance films (400-1600 AA) were formed by anodizing sputtered tantalum oxide films. The electrical properties of these two-step oxidized and sputtered/anodized films are compared with those…
High quality r.f. sputtered metal oxides (Ta2O5, HfO2) and their properties after annealing
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