Optimally minimizing overlay violation in self-aligned double patterning decomposition for row-based standard cell layout in polynomial time

@article{Xiao2013OptimallyMO,
  title={Optimally minimizing overlay violation in self-aligned double patterning decomposition for row-based standard cell layout in polynomial time},
  author={Zigang Xiao and Yuelin Du and Haitong Tian and Martin D. F. Wong},
  journal={2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD)},
  year={2013},
  pages={32-39}
}
Self-aligned double patterning is one of the most promising double patterning techniques for sub-20nm nodes. As in any multiple patterning techniques, layout decomposition is the most important problem. In SADP decomposition, overlay is among the most primary concerns. Most of the existing works target at minimizing the overall overlay, while others totally forbid the overlay. On the other hand, most of the works either rely on exponential time methods, or apply heuristic that cannot guarantee… CONTINUE READING
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