Optimal reduction of a monitoring grid for SiO2 deposition surface over a wafer for semiconductor devices

@inproceedings{Zappa2010OptimalRO,
  title={Optimal reduction of a monitoring grid for SiO2 deposition surface over a wafer for semiconductor devices},
  author={D. Zappa and Riccardo Borgoni and Luigi Radaelli and Valeria Tritto},
  year={2010}
}
Normal 0 14 false false false IT X-NONE X-NONE MicrosoftInternetExplorer4 /* Style Definitions */ table.MsoNormalTable {mso-style-name:"Tabella normale"; mso-tstyle-rowband-size:0; mso-tstyle-colband-size:0; mso-style-noshow:yes; mso-style-priority:99; mso-style-qformat:yes; mso-style-parent:""; mso-padding-alt:0cm 5.4pt 0cm 5.4pt; mso-para-margin:0cm; mso-para-margin-bottom:.0001pt; mso-pagination:widow-orphan; font-size:11.0pt; font-family:"Calibri","sans-serif… CONTINUE READING

Citations

Publications citing this paper.
SHOWING 1-2 OF 2 CITATIONS