Optical nanolithography with k / 15 resolution using bowtie aperture array

@inproceedings{Wen2014OpticalNW,
  title={Optical nanolithography with k / 15 resolution using bowtie aperture array},
  author={Xiaolei Wen and Luis M. Traverso and Pornsak Srisungsitthisunti and Xianfan Xu and Euclid Eberle Moon},
  year={2014}
}
We report optical parallel nanolithography using bowtie apertures with the help of the interferometricspatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and… CONTINUE READING