Optical Observation of Gas Jet Z-pinch Discharge Produced Extreme Ultraviolet Light Source

Summary form only given. A gas jet Z-pinch discharge light source has been developed for realize the EUV lithography. Our original light source has advantages of a smaller size of pinch plasma, a larger collection solid angle and possibility of low debris emission. It is well-known that the debris generation is an inherent problem of the discharge produced… CONTINUE READING