One-step lithography for various size patterns with a hybrid mask-mold

@inproceedings{Cheng2004OnestepLF,
  title={One-step lithography for various size patterns with a hybrid mask-mold},
  author={Xing Cheng and L. Jay Guo},
  year={2004}
}
Nanoimprint lithography (NIL) has been successfully employed in nanoscale patterning, however, it is known to have limitations in replicating large-scale (hundreds of microns and larger) and nanoscale patterns simultaneously. In this letter, we present a novel lithographic technique that integrates photolithography into the NIL patterning process. This technique uses a hybrid mask-mold that has large metal pads embedded in a transparent NIL mold. Such a hybrid mold allows both largeand… CONTINUE READING
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