On Wafer Rework Strategies and Dispatching Rules at the Photolithography Stage

@inproceedings{Sha2003OnWR,
  title={On Wafer Rework Strategies and Dispatching Rules at the Photolithography Stage},
  author={Y. Sha and Ling-Feng Hsieh and Shih-Hsing Lin},
  year={2003}
}
Due to the high costs of wafer materials and machines, it is feasible to apply rework to increase wafer yield at the photolithography stage. At the same time, in order to maintain good fabrication quality, shorten the process time and meet the required due date, it is absolutely necessary to have good rework strategies for wafer rework so as to make up the… CONTINUE READING