OPC model error study through mask and SEM measurement error

  • Mame Kouna Top, David Fuard, +5 authors Mame Kouna
  • Published 2010

Abstract

Mask and metrology errors such as SEM (Scanning Electron Microscopy) measurement errors are currently not accounted for when calibrating OPC models. Nevertheless, they can lead to erroneous model parameters therefore causing inaccuracies in the model prediction if these errors are of the same order of magnitude than targeted modeling accuracy. In this study… (More)

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