Numerical Study on Fabrication Tolerance of Half-Ridge InP Polarization Converters

@article{Zaitsu2014NumericalSO,
  title={Numerical Study on Fabrication Tolerance of Half-Ridge InP Polarization Converters},
  author={Masaru Zaitsu and Takuo Tanemura and Yoshiaki Nakano},
  journal={IEICE Transactions},
  year={2014},
  volume={97-C},
  pages={731-735}
}
Integrated InP polarization converters based on half-ridge structure are studied numerically. We demonstrate that the fabrication tolerance of the half-ridge structure can be extended significantly by introducing a slope at the ridge side and optimizing the thickness of the residual InGaAsP layer. High polarization conversion over 90% is achieved with the broad range of the waveguide width from 705 to 915 nm, corresponding to a factor-of-two or larger improvement in the fabrication tolerance… CONTINUE READING
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