Novel method for error limit determination in x-ray reflectivity analysis

Abstract

A novel error limit determination method for x-ray reflectivity (XRR) analysis is developed and applied to data measured from atomic-layer-deposited aluminium oxide on silicon. The analysis here is based on Parratt’s formalism and on a fitness defined as a mean-squared error between a measurement and a fit in logarithmic scales. The mathematically derived… (More)

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