Novel Vertical 3D Structure of TaOx-based RRAM with Self-localized Switching Region by Sidewall Electrode Oxidation

Abstract

A novel vertical 3D RRAM structure with greatly improved reliability behavior is proposed and experimentally demonstrated through basically compatible process featuring self-localized switching region by sidewall electrode oxidation. Compared with the conventional structure, due to the effective confinement of the switching region, the newly-proposed… (More)
DOI: 10.1038/srep21020

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0204020162017
Citations per Year

Citation Velocity: 11

Averaging 11 citations per year over the last 2 years.

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