Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

Abstract

We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. 
DOI: 10.1021/nl903841a

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