Nitric acid photolysis on surfaces in low-NOx environments: Significant atmospheric implications

@inproceedings{Zhou2003NitricAP,
  title={Nitric acid photolysis on surfaces in low-NOx environments: Significant atmospheric implications},
  author={Xianliang Zhou and Honglian Gao and Yi He and Gu Huang and Steven B. Bertman and Kevin L. Civerolo and James J. Schwab},
  year={2003}
}
[1] Nitric acid (HNO3) is the dominant end product of NOx (= NO + NO2) oxidation in the troposphere, and its dry deposition is considered to be a major removal pathway for the atmospheric reactive nitrogen. Here we present both field and laboratory results to demonstrate that HNO3 deposited on ground and vegetation surfaces may undergo effective photolysis to form HONO and NOx, 1–2 orders of magnitude faster than in the gas phase and aqueous phase. With this enhanced rate, HNO3 photolysis on… CONTINUE READING

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