New reaction kinetic aspects of the thermal oxidation of sputtered tantalum (nitride) layers

@inproceedings{Kolonits1977NewRK,
  title={New reaction kinetic aspects of the thermal oxidation of sputtered tantalum (nitride) layers},
  author={V. P. Kolonits and T. Strausz and Mih{\'a}ly Koltai},
  year={1977}
}
We have examined the thermal oxidation of tantalum (nitride) layers prepared for resistor application in order to find a kinetic model suitable to describe both short- and long-term changes occurring in the range between 200 and 360°C. The oxidation process was followed by resistivity measurements and the results so obtained were checked against a specially devised coulombmetry and SIMS method.