New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout

@inproceedings{Kahng2001NewGB,
  title={New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout},
  author={Andrew B. Kahng and Shailesh Vaya and Alex Zelikovsky},
  booktitle={ASP-DAC},
  year={2001}
}
We describe new graph bipartization algorithms for lay-out modification and phase assignment of bright-field alternating phase-shifting masks (AltPSM) [25]. The problem of layout modification for phase-assignability reduces to the problem of making a certain layout-derived graph bipartite (i.e., 2-colorable). Previous work [3] solves bipartization optimally for the dark field alternating PSMregime. Only one degree of freedom is allowed (and relevant) for such a bipartization: edge deletion… CONTINUE READING
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