Corpus ID: 113984509

Neural Network Predictive R2R Control to CMP Process

  title={Neural Network Predictive R2R Control to CMP Process},
  author={L. Wang and J. Hu},
  • L. Wang, J. Hu
  • Published 2011
  • Engineering
  • For chemical mechanical polishing(CMP)process characteristics of nonlinear, time-varying and not being in-situ measured, this paper proposes a CMP process neural network predictive run-to-run(R2R) controller named NNPR2R. RBF neural network predictive model about CMP is constructed by subtractive clustering algorithm and least squares method, thus it solves difficult problem of constructing accurate mathematical model of complicated CMP process and improves the prediction accuracy. Control law… CONTINUE READING

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