Net sputtering rate due to hot ions in a Ne-Xe discharge gas bombarding an MgO layer

@article{Ho2011NetSR,
  title={Net sputtering rate due to hot ions in a Ne-Xe discharge gas bombarding an MgO layer},
  author={S. Ho and T. Tamakoshi and M. Ikeda and Y. Mikami and Kenkichi Suzuki},
  journal={Journal of Applied Physics},
  year={2011},
  volume={109},
  pages={084908}
}
An analytical method is developed for determining net sputtering rate for an MgO layer under hot ions with low energy (<100 eV) in a neon-xenon discharge gas at near-atmospheric pressure. The primary sputtering rate is analyzed according to spatial and energy distributions of the hot ions with average energy, Ehi, above a threshold energy of sputtering, Eth,i, multiplied by a yield coefficient. The threshold energy of sputtering is determined from dissociation energy required to remove an atom… Expand
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