NbN thin films reactively sputtered with a high‐field direct‐current magnetron

@inproceedings{Deen1988NbNTF,
  title={NbN thin films reactively sputtered with a high‐field direct‐current magnetron},
  author={M. Jamal Deen and Dolf Landheer and John Donald Wade and G. Irwin Sproule and M. D. Denhoff},
  year={1988}
}
The chemical (Auger electron spectroscopy) and electrical characterizations of NbN thin films reactively sputtered with a high‐field dc magnetron under varying conditions are described. The films were deposited onto polished silicon and glass substrates which were maintained at close to ambient temperature. A study of the chemical composition, transition temperature, transition width, and sheet resistance ratio was made to determine the optimum conditions for the NbN thin‐film preparation. The… CONTINUE READING