Nanoscale lithography of LaAlO₃/SrTiO₃ wires using silicon stencil masks.

Abstract

We have developed a process to fabricate low-stress, fully crystalline silicon nanostencils, based on ion irradiation and the electrochemical anodization of p-type silicon. These nanostencils can be patterned with arbitrary feature shapes with openings hundreds of micrometers wide connected to long channels of less than 100 nm in width. These nanostencils… (More)
DOI: 10.1088/0957-4484/25/44/445301

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Cite this paper

@article{Azimi2014NanoscaleLO, title={Nanoscale lithography of LaAlO₃/SrTiO₃ wires using silicon stencil masks.}, author={S.. Azimi and J. Song and C. J. Li and S. Mathew and Mark B. H. Breese and T Venkatesan}, journal={Nanotechnology}, year={2014}, volume={25 44}, pages={445301} }