Nanopatterning of InP(001) surface using e-beam lithography to localize InAs quantum dots for single photon source application


This work is devoted to the localization of InAs quantum dots grown by SSMBE on nanostructured InP(001) surfaces: mesas or holes are the sites of privileged nucleation of the quantum dots (QDs). Both nanostructuration methods are compared. The principle of fabrication of a photonic crystal cavity based source with localized QDs is described 

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