Nanopatterning of InP(001) surface using e-beam lithography to localize InAs quantum dots for single photon source application

Abstract

This work is devoted to the localization of InAs quantum dots grown by SSMBE on nanostructured InP(001) surfaces: mesas or holes are the sites of privileged nucleation of the quantum dots (QDs). Both nanostructuration methods are compared. The principle of fabrication of a photonic crystal cavity based source with localized QDs is described 

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