Nanometer-level repeatable metrology using the Nanoruler

@article{Konkola2003NanometerlevelRM,
  title={Nanometer-level repeatable metrology using the Nanoruler},
  author={Paul Thomas Konkola and Carl Gang Chen and Ralf K. Heilmann and Chulmin Joo and Juan Montoya and Chih‐Hao Chang and Mark L. Schattenburg},
  journal={Journal of Vacuum Science \& Technology B},
  year={2003},
  volume={21},
  pages={3097-3101}
}
We report on the measurement of the fringe-to-substrate phase error in our Nanoruler system. This system utilizes scanning beam interference lithography to pattern and measure large-area, nanometer-accuracy gratings that are appropriate for semiconductor and integrated opto-electronic metrology. We present the Nanonruler’s metrology system that is based on digital frequency synthesizers, acousto-optics, and heterodyne phase sensing. It is used to assess the fringe-to-substrate placement… Expand
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