Nanometer gaps by feedback-controlled electromigration

  title={Nanometer gaps by feedback-controlled electromigration},
  author={Victor Chi-Yuan Shih and Si-Yang Zheng and A. Chang and Yu-Chong Tai},
  journal={TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)},
  pages={1530-1533 vol.2}
  • V. Shih, Si-Yang Zheng, Y. Tai
  • Published 8 June 2003
  • Engineering
  • TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)
Nanometer-sized gap (or nanogap) is one of the most fundamental devices in the nanotechnology field. Park et. al., first proposed the open-circuit electromigration method to fabricate nanogaps, but the process is only repeatable if Au film is thinner than 20 nm. To overcome these drawbacks, we develop the feedback-controlled electromigration process and find that not only repeatable nanogaps can be created in thicker film (up to 120 nm or thicker in our experiments), but superior gap size… 

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