Nanolithography with metastable helium atoms in a high-power standing-wave light field

@article{Petra2004NanolithographyWM,
  title={Nanolithography with metastable helium atoms in a high-power standing-wave light field},
  author={S.J.H. Petra and L. Feenstra and W. Hogervorst and W. Vassen},
  journal={Applied Physics B},
  year={2004},
  volume={78},
  pages={133-136}
}
  • S.J.H. Petra, L. Feenstra, +1 author W. Vassen
  • Published 2004
  • Materials Science, Physics
  • Applied Physics B
  • We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrophobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely collimated and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 107) increases the confinement of the atoms in the standing wave considerably, and… CONTINUE READING
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