Nanolithography on graphene by using scanning tunneling microscopy in a methanol environment.

Abstract

Since it was discovered in 2004, graphene has attracted enormous attention as an emerging material for future devices, but it has been found that conventional lithographic processes based on polymer resist degrade its intrinsic performance. Recently, our group studied a resist-free scanning tunneling microscopy-based lithography in various atmospheres by… (More)
DOI: 10.1017/S1431927613013329

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