Nanolithography: Written with light.

@article{hernandezSantana2010NanolithographyWW,
  title={Nanolithography: Written with light.},
  author={aaron hernandez-Santana and Duncan Graham},
  journal={Nature nanotechnology},
  year={2010},
  volume={5 9},
  pages={
          629-30
        }
}
An array of polymer tips that can channel light to an underlying substrate can be used to generate intricate nanostructures with high throughput and over large areas. 
View on PubMed
mipd.snu.ac.kr
1 Citations

Figures from this paper

One Citation

Citation Type

Citation Type

Degradation of polymer films
In this review paper the current state of research into the physical degradation of polymer films is elucidated. Modern applications of polymer films and the implication of their degradation are…

References

SHOWING 1-6 OF 6 REFERENCES
HIGH-RESOLUTION LITHOGRAPHY WITH NEAR-FIELD OPTICAL MICROSCOPY
Scanning near-field optical microscopy (SNOM) is used for lithography to avoid the resolution limiting diffraction of conventional optical methods. We have expanded a commercial SNOM for writing even…
Self-leveling two-dimensional probe arrays for Dip Pen Nanolithography.
TLDR
This methodology brings us closer to the goal of true nanomanufacturing by automating the leveling process, reducing setup time by at least a factor of 10, enhancing the ease of the overall printing process, and ultimately ensuring a more level device with subsequently homogeneous nanostructure.
"Force-feedback" leveling of massively parallel arrays in polymer pen lithography.
TLDR
A new method is described that utilizes the force between the pen arrays and the surface to achieve leveling with a tilt of less than 0.004 degrees, thereby producing features that vary by only 50 nm over 1 cm.
Two-Color Single-Photon Photoinitiation and Photoinhibition for Subdiffraction Photolithography
TLDR
A two-color irradiation scheme whereby initiating species aregenerated by single-photon absorption at one wavelength while inhibiting species are generated by single, independent wavelength thus reduces the polymerization rate, delaying gelation of the material and facilitating enhanced spatial control over the polymerized region.
Achieving λ/20 Resolution by One-Color Initiation and Deactivation of Polymerization
TLDR
An approach to photolithography is introduced in which multiphoton absorption of pulsed 800-nanometer (nm) light is used to initiate cross-linking in a polymer photoresist and one-photon absorption of continuous-wave 800-nmLight is used simultaneously to deactivate the photopolymerization.
Confining Light to Deep Subwavelength Dimensions to Enable Optical Nanopatterning
Subwavelength Patterning Microscopists have recently achieved fluorescence imaging at subwavelength resolution by focusing one beam of light in a halo around another beam, thereby quenching the glow…