Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds.


We present a process based on nanoimprint lithography for the fabrication of a microchannel mold having nanopatterns formed at the bottoms of its microchannels. A focused laser beam selectively cures the resist in the micrometer scale during nanoimprint lithography. Nanopatterns within the microchannels may be used to control microfluidic behavior. 
DOI: 10.1039/c3lc50202c