Nanoimprint lithography of high-density cobalt dot patterns for fine tuning of dipole interactions

@inproceedings{Natali2001NanoimprintLO,
  title={Nanoimprint lithography of high-density cobalt dot patterns for fine tuning of dipole interactions},
  author={Marco Natali and Amira Lebib and Edmond Cambril and Yangyin Chen and Ioan Lucian Prejbeanu and Kamel Ounadjela},
  year={2001}
}
A trilayer nanoimprint process was used to fabricate high-density Co dot arrays. It is shown that choosing hybrane as the top layer resist gives better dimensional control of the replicated patterns compared to PMMA. By adjusting the etching time in the transfer process the dot sizes could be tailored in a wide range. The fabricated dot arrays with different sizes and period have then been studied by magneto-optic and magnetic-force microscopy measurements. The magnetization reversal was found… CONTINUE READING

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