Nanoimprint lithography

@inproceedings{Chou1996NanoimprintL,
  title={Nanoimprint lithography},
  author={Stephen Y. Chou and Peter R. Krauss and Preston J. Renstrom},
  year={1996}
}
Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Nanoimprint lithography has demonstrated 25 nm feature size, 70 nm pitch, vertical and smooth sidewalls, and nearly 90° corners. Further experimental study indicates that the ultimate resolution of nanoimprint lithography could be sub-10 nm, the imprint process is repeatable, and the mold is durable. In addition, uniformity… CONTINUE READING
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