Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si3N4 mask

@inproceedings{Guo2014NanofabricationOM,
  title={Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si3N4 mask},
  author={Jian Hong Guo and Bingjun Yu and X. Sheldon Wang and Linmao Qian},
  booktitle={Nanoscale research letters},
  year={2014}
}
A new fabrication method is proposed to produce nanostructures on monocrystalline silicon based on the friction-induced selective etching of its Si3N4 mask. With low-pressure chemical vapor deposition (LPCVD) Si3N4 film as etching mask on Si(100) surface, the fabrication can be realized by nanoscratching on the Si3N4 mask and post-etching in hydrofluoric… CONTINUE READING