Nano-cube MgO formed on silicon substrate using pulsed laser deposition.

Abstract

Nano-cube MgO particles were formed on Si substrates by deposition of an MgO target using pulsed laser deposition method. An epitaxial film grows on Si(001) substrate with its contraction of lattice constants. In this study, expecting high quality MgO film, the MgO film prepared in the oxygen pressure ranging from 75-400 mTorr at the high temperature of… (More)

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@article{Kaneko2012NanocubeMF, title={Nano-cube MgO formed on silicon substrate using pulsed laser deposition.}, author={Satoru Kaneko and Takeshi Ito and Kensuke Akiyama and Manabu Yasui and Yasuo Hirabayashi and Masayasu Soga and Yumiko Miyake and Mamoru Yoshimoto}, journal={Journal of nanoscience and nanotechnology}, year={2012}, volume={12 3}, pages={2320-5} }