NBTI tolerant microarchitecture design in the presence of process variation

  title={NBTI tolerant microarchitecture design in the presence of process variation},
  author={Xin Fu and Tao Li and Jos{\'e} A. B. Fortes},
  journal={2008 41st IEEE/ACM International Symposium on Microarchitecture},
Negative bias temperature instability (NBTI), which reduces the lifetime of PMOS transistors, is becoming a growing reliability concern for sub-micrometer CMOS technologies. Parametric variation introduced by nano-scale device fabrication inaccuracy can exacerbate the PMOS transistor wear-out problem and further reduce the reliable lifetime of microprocessors. In this work, we propose microarchitecture design techniques to combat the combined effect of NBTI and process variation (PV) on the… CONTINUE READING
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