Monitoring of local and global temperature non-uniformities by means of Therma-Probe and Micro Four-Point Probe metrology

The introduction of millisecond annealing in advanced CMOS process flows turns out to generate considerable temperature variations which can enhance the device dispersion. In the present work we report on the use of inline Therma-Probe (TP) and Micro Four-Point Probe (M4PP) metrology to assess these temperature variations on shallow trench isolation (STI… CONTINUE READING