Molecular design of ultralow - k insulator materials

Abstract

Dielectric materials with low permittivity (low k) are required for insulation to reduce the interconnect RC-delay in deep submicron integrated circuits. Combinations of classical and quantum-theoretical approaches for the assessment of the dielectric properties of fullerene-based materials with the goal to find ultralow-k dielectrics with suitable… (More)

Topics

4 Figures and Tables

Cite this paper

@inproceedings{ZagorodniyMolecularDO, title={Molecular design of ultralow - k insulator materials}, author={Kostya Zagorodniy and Holger L Hermann and Marianne Taut} }