Molecular Dynamic Simulation on Combustion Process of Silicon-Doped Amorphous Carbon Film for Heat-Assisted Magnetic Recording

@article{Liu2018MolecularDS,
  title={Molecular Dynamic Simulation on Combustion Process of Silicon-Doped Amorphous Carbon Film for Heat-Assisted Magnetic Recording},
  author={Qingkang Liu and Longqiu Li and Cijun Shuai},
  journal={2018 Asia-Pacific Magnetic Recording Conference (APMRC)},
  year={2018},
  pages={1-3}
}
Reactive molecular dynamics (MD) simulations are performed to investigate combustion process of silicon-doped amorphous carbon (a-C:Si) films for heat-assisted magnetic recording (HAMR). The evolution of atomic structure, system potential energy, O2 molecules consumption, number of Si-O bond and C-O bond are analyzed. The silica suboxide layers on the surfaces act as protecting layers and prevent the oxidation of carbon atoms at low temperatures. The a-C:Si film burns when temperature is above… CONTINUE READING

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