Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

@inproceedings{Zhang2015ModelingAE,
  title={Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime},
  author={Yu-ru Zhang and Stefan Tinck and Peter De Schepper and You-Nian Wang and Annemie Bogaerts},
  year={2015}
}
A two-dimensional hybrid Monte Carlo–fluid model, incorporating a full-wave solution of Maxwell's equations, is employed to describe the behavior of high frequency (HF) and very high frequency capacitively coupled plasmas (CCPs), operating both at single frequency (SF) and dual frequency (DF) in a CF4/O2 gas mixture. First, the authors investigate the plasma composition, and the simulations reveal that besides CF4 and O2, also COF2, CF3, and CO2 are important neutral species, and CF3+ and F… CONTINUE READING

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