Model based double patterning lithography (DPL) and simulated annealing (SA)

@article{Rodrigues2011ModelBD,
  title={Model based double patterning lithography (DPL) and simulated annealing (SA)},
  author={Rance Rodrigues and Sandip Kundu},
  journal={2011 12th International Symposium on Quality Electronic Design},
  year={2011},
  pages={1-8}
}
Double Patterning Lithography (DPL) is currently being used as part of Resolution Enhancement Technique (RET) in 45nm and 32nm technologies. DPL involves partitioning a layout into two masks to reduce interference from neighboring patterns and improve resolution. Triple pattern lithography has also been suggested as a way to continue scaling with trailing… CONTINUE READING