Mirror-based pattern generation for maskless lithography

  title={Mirror-based pattern generation for maskless lithography},
  author={William G. Oldham and Yashesh Shroff},
In this paper, we consider the composition of integrated circuit patterns using dense arrays of mirrors. Typically the mirrors are 10-100 wavelengths in size and are demagnified some to form slightly sub-resolution spots or pixels at the wafer. The mirrors are actuated to modulate the light intensity. We consider both pure phase mirrors, moved in pistonlike fashion, and tilting mirrors, which provide a mix of amplitude and phase modulation. We compare the image quality and useful process window… CONTINUE READING

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