## An Effective Chemical Mechanical Polishing Fill Insertion Approach

- Chuangwen Liu, Peishan Tu, +4 authors Evangeline F. Y. Young
- ACM Trans. Design Autom. Electr. Syst.
- 2016

Highly Influenced

4 Excerpts

- Published 1989 in Symposium on Computational Geometry

The minimum rectangular partition problem for a simple rectilinear polygon is to partition the interior of a simple rectilinear polygon into minimum number of rectangles. This problem is related to VLSI mask generation. A VLSI mask is usually a piece of glass with a figure engraved on it. The engraved figure can be viewed as a rectilinear polygon on the digitized plane [OHTS82]. In order to engrave the figure on the VLSI mask, a pattern generator is often used. A traditional pattern generator has a rectangular opening for exposure, which exposes rectangles onto the mask. Therefore, the engraved figure has to be decomposed into rectangles such that the pattern generator can expose each of these rectangles. The number of rectangles will determine the time required for mask generation. Therefore, decomposing a rectilinear polygon into minimum number of rectan mask P les is an important problem for optimal automated VLSI abrication. The decomposition can be classified into two types depending on the resulted rectan 1e.s. If the resulted rectangles can not overlap with % eat other, then the decom”psition is a partition.If the resulted rectangles overlap with each other, then the decomposition is a m. Both partitioning approach and covering approach for VLSI mask

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@inproceedings{Liou1989MinimumPS,
title={Minimum Partitioning Simple Rectilinear Polygons in o(n log log n) Time},
author={W. T. Liou and Jimmy J. M. Tan and Richard C. T. Lee},
booktitle={Symposium on Computational Geometry},
year={1989}
}