Microwave annealing for preparation of crystalline hydroxyapatite thin films

@article{Adams2006MicrowaveAF,
  title={Microwave annealing for preparation of crystalline hydroxyapatite thin films},
  author={D. Adams and G. F. Malgas and R. Smith and S. Massia and T. Alford and J. Mayer},
  journal={Journal of Materials Science},
  year={2006},
  volume={41},
  pages={7150-7158}
}
A sol was spun on single crystal silicon substrates at a spin-rate of 3000–5000 rpm followed by a low temperature cure to form a stable sol–gel/silicon structure. Good quality crystalline HA films of thickness ∼300–400 nm were obtained by annealing the sol–gel/Si structure in a conventional cavity applicator microwave system with a magnetron power of 1300 W, frequency of 2.45 GHz, and at a low processing temperature of 425 °C for annealing times ranging from 2–60 min. X-ray Diffraction and FTIR… Expand

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