Method of robust pattern design for lens aberration

@inproceedings{Komine2004MethodOR,
  title={Method of robust pattern design for lens aberration},
  author={Nobuhiro Komine and Kenji Konomi and Keita Asanuma and K. Tawarayama and T. Higashiki},
  booktitle={SPIE Advanced Lithography},
  year={2004}
}
  • Nobuhiro Komine, Kenji Konomi, +2 authors T. Higashiki
  • Published in SPIE Advanced Lithography 2004
  • Mathematics, Engineering
  • Recently, the critical dimension (CD) abnormality due to lens aberrations of exposure tool has become one of the critical issues in production of semiconductor devices. The most remarkable feature of CD abnormality due to lens aberration is asymmetry of symmetric twin pattern. And the asymmetry is only caused by a particular aberration because the influence on CD abnormality of lens aberration depends on the device pattern shape. Therefore, it is important to know the interaction of the device… CONTINUE READING
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