Method of manufacturing an electro-optical device

@inproceedings{2005MethodOM,
  title={Method of manufacturing an electro-optical device},
  author={秀一 今井 and 浩志 小原 and 均 西澤 and 飯島 千代明},
  year={2005}
}
PROBLEM TO BE SOLVED: To prevent after-corrosion from occurring more securely in a method of forming a metal thin film pattern wherein an etching mask 140 is formed on an upper surface of a metal thin film 130 made of aluminum formed on a substrate 110 and dry etching using a mixed gas containing a halogen-based gas is carried out on the metal thin film through the etching mask to form the metal thin film pattern 130 in a predetermined shape, or in a method for manufacturing an electrooptical… CONTINUE READING